Imaging interferometric lithography ( iil ) transfers different components of spatial frequencies through the same limited aperture at different time to enhance the resolution power of lithography with increasing less cost of system 摘要掩模投影成像干涉光刻技術(shù)以在很小或幾乎不增加光刻系統(tǒng)成本的基礎(chǔ)上來提高光刻分辨率為目的,充分利用系統(tǒng)的有限孔徑,將掩模圖形不同的空間頻率分別進行傳遞,最終以高分辨率對掩模成像。
The algorithm only needs to solve an ill - posed linear system and a well - posed minimization problem and requires only the knowledge of the near field measurements of the scattered fields due to point source fields at a finite number of incidence and observation points distributed over a limited aperture 該算法只需求解一個不適定的線性系和一個適定的非線性最小化問題,而且只需要點源入射場的散射場在某個有限孔徑中若干有限個入射和測量點上的近場測量信息。